Gas processing equipment

TW202635058APending Publication Date: 2026-08-16TOKYO ELECTRON LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW115117154
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-06-10
Filing Date
2022-06-02
Publication Date
2026-08-16

Smart Images

  • Figure TWG2TA001073602_001
    Figure TWG2TA001073602_001
  • Figure TWG2TA001073602_002
    Figure TWG2TA001073602_002
  • Figure TWG2TA001073602_003
    Figure TWG2TA001073602_003
Patent Text Reader

Abstract

[Problem] Reducing the amount of dissolving solution used. [Solution] A gas processing apparatus includes a conduit, a partition plate, and a liquid supply unit. The conduit has an internal flow path for gas passage. The partition plate is a porous material formed to divide the flow path into multiple spaces, allowing gas to pass through while retaining liquid. The liquid supply unit supplies the partition plate with a dissolving solution capable of dissolving the target component contained in the gas. Then, the gas processing apparatus brings the dissolving solution held at the partition plate into contact with the gas passing through the flow path.
Need to check novelty before this filing date? Find Prior Art