Gas processing equipment
TW202635058APending Publication Date: 2026-08-16TOKYO ELECTRON LTD
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Patent Information
- Application Number
- TW115117154
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2021-06-10
- Filing Date
- 2022-06-02
- Publication Date
- 2026-08-16
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Figure TWG2TA001073602_001 
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Abstract
[Problem] Reducing the amount of dissolving solution used. [Solution] A gas processing apparatus includes a conduit, a partition plate, and a liquid supply unit. The conduit has an internal flow path for gas passage. The partition plate is a porous material formed to divide the flow path into multiple spaces, allowing gas to pass through while retaining liquid. The liquid supply unit supplies the partition plate with a dissolving solution capable of dissolving the target component contained in the gas. Then, the gas processing apparatus brings the dissolving solution held at the partition plate into contact with the gas passing through the flow path.
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