Substrate cleaning apparatus, substrate cleaning method, and control method of substrate cleaning apparatus

Abstract

This invention can improve the cleaning power of the substrate. This invention provides a substrate cleaning apparatus, comprising: a two-fluid nozzle for supplying two fluids to a rotating substrate; a first rinsing nozzle for supplying rinsing liquid to the rotating substrate; and a moving mechanism for holding and moving the two-fluid nozzle and the first rinsing nozzle, wherein: when the center side of the rotating substrate is taken as the upstream side and the outer peripheral side of the substrate is taken as the downstream side, the first rinsing nozzle supplies rinsing liquid to a position further upstream or further downstream than the position where the two fluids are supplied.

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