Methods and apparatus for processing a substrate using ellipsometry

Abstract

Methods and apparatus for processing a substrate are provided herein. For example, a method includes using an extended spectroscopic ellipsometer to direct a beam of electromagnetic radiation having a beam energy toward a portion of a substrate at an incident angle to produce an extended spectroscopic ellipsometry (ESE) data set from the portion of the substrate which includes a measured change of a phase and / or an amplitude of the beam of electromagnetic radiation reflecting away from the portion of the substrate relative to the beam of electromagnetic radiation directed toward the portion of the substrate. One or more properties of the portion of the substrate are then determined based at least in part on the ESE data set of the portion of the substrate.

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