Wet processing device with gas-liquid mixing

TW202635132APending Publication Date: 2026-08-16YIELD ENGINEERING SYSTEMS INC
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Patent Information

Application Number
TW114148192
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-10
Filing Date
2025-12-09
Publication Date
2026-08-16

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Abstract

An apparatus for wet chemical processing of multiple substrates consists of a processing tank that supports these substrates. Positioned within this tank, a flow plate is situated below the substrates when they are in place. This flow plate features numerous orifices that are configured to discharge a liquid solution containing a dispersion of gas bubbles towards the substrates.
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