Batch-type substrate processing apparatus

Abstract

The present disclosure relates to a batch-type substrate processing apparatus, which is capable of securing uniformity of a substrate processing process. According to an exemplary embodiment, a batch-type substrate processing apparatus includes a reaction tube configured to provide an inner space extending in a vertical direction, a substrate boat configured to laminate a plurality of substrates in multiple stages in the vertical direction, a heating part provided outside the reaction tube to supply thermal energy into the inner space, a hollow manifold configured to support the reaction tube; a seal cap part configured to support the substrate boat and open and close an opened lower end of the manifold, and a pedestal provided between the substrate boat and the seal cap part and including a first insulation member that provides an inclined surface intersecting a horizontal direction.

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