Substrate processing device

Abstract

The present invention is a substrate processing apparatus for processing substrates, comprising: a processing chamber forming a processing space for the substrate inside; a heating mechanism for adjusting the internal temperature of the processing chamber; and an internal component disposed inside the processing chamber; wherein the heating mechanism comprises: an induction heating element for heating at least the internal component by induction of a magnetic field; and a magnetic field generating unit for generating the induction magnetic field.

Images