Deposition method

TW202635397APending Publication Date: 2026-09-01ASM IP HLDG BV
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Patent Information

Application Number
TW115117632
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2019-10-08
Filing Date
2020-09-28
Publication Date
2026-09-01

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Abstract

A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.
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