Liquid treatment apparatus and liquid treatment method
TW202635407APending Publication Date: 2026-09-01TOKYO ELECTRON LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114137846
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-10-10
- Filing Date
- 2025-10-01
- Publication Date
- 2026-09-01
Smart Images

Figure TWG2TA001074322_001 
Figure TWG2TA001074322_002 
Figure TWG2TA001074322_003
Abstract
[Problem] Preventing particles generated by a switch valve located in a drain flow path from flowing into a supply flow path. [Solution] A liquid treatment apparatus that uses a heated treatment liquid for treatment, characterized by comprising: a supply flow path for supplying treatment liquid from a treatment liquid supply source to a supply unit; a heating unit disposed in the supply flow path for heating the treatment liquid; and a drain flow path for draining the treatment liquid from the supply flow path, the drain flow path comprising: a drain flow path connected to the supply flow path upstream of the heating unit; a switch valve disposed in the drain flow path; and a gas layer holding unit disposed upstream of the switch valve in the drain flow path, holding a gas layer at the upper part and holding the treatment liquid at the lower part, thereby preventing the continuous presence of treatment liquid between the heating unit and the switch valve by the gas held by the gas layer holding unit.
Need to check novelty before this filing date? Find Prior Art