Liquid treatment apparatus and liquid treatment method

TW202635407APending Publication Date: 2026-09-01TOKYO ELECTRON LTD
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Patent Information

Application Number
TW114137846
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-10
Filing Date
2025-10-01
Publication Date
2026-09-01

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    Figure TWG2TA001074322_003
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Abstract

[Problem] Preventing particles generated by a switch valve located in a drain flow path from flowing into a supply flow path. [Solution] A liquid treatment apparatus that uses a heated treatment liquid for treatment, characterized by comprising: a supply flow path for supplying treatment liquid from a treatment liquid supply source to a supply unit; a heating unit disposed in the supply flow path for heating the treatment liquid; and a drain flow path for draining the treatment liquid from the supply flow path, the drain flow path comprising: a drain flow path connected to the supply flow path upstream of the heating unit; a switch valve disposed in the drain flow path; and a gas layer holding unit disposed upstream of the switch valve in the drain flow path, holding a gas layer at the upper part and holding the treatment liquid at the lower part, thereby preventing the continuous presence of treatment liquid between the heating unit and the switch valve by the gas held by the gas layer holding unit.
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