Colloidal silica and chemical mechanical polishing composition comprising the same
TW202635584APending Publication Date: 2026-09-01ENF TECH CO LTD +1
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Patent Information
- Application Number
- TW114151523
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-12-24
- Filing Date
- 2025-12-26
- Publication Date
- 2026-09-01
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Abstract
eV in a spectrum measured by X-ray photoelectron spectroscopy (XPS), an intensity of the first peak is greater than an intensity of the second peak, the colloidal silica has absorption peaks at a first wavenumber (n1) of
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