Colloidal silica and chemical mechanical polishing composition comprising the same

TW202635585APending Publication Date: 2026-09-01ENF TECH CO LTD +1
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Patent Information

Application Number
TW114151526
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-12-24
Filing Date
2025-12-26
Publication Date
2026-09-01

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Abstract

eV in an X-ray photoelectron spectroscopy (XPS) spectrum, the intensity of the first peak may be greater than that of the second peak, and the colloidal silica may have a first scattering peak at
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