Photoresist compositions and pattern formation methods
TW202635621APending Publication Date: 2026-09-01DuPont Electronic Materials International LLC
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Patent Information
- Application Number
- TW114150787
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-26
- Filing Date
- 2025-12-23
- Publication Date
- 2026-09-01
Abstract
A photoresist composition including a first component; a second component; and a solvent, wherein the first component comprises a non-polymeric onium salt acid generator, and a cation of the non-polymeric onium salt generator comprises an acid labile group, wherein the second component comprises a hydroxyaryl group, and the second component does not comprise an acid labile group, and wherein the photoresist composition does not comprise a polymer that comprises an acid labile group.
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