Resins, compositions, photocrosslinkers, and electronic devices having the same.

Abstract

A resin with hydrophobic properties is provided, which is insoluble in solvents by photocrosslinking with low exposure. The resin of the present invention is a resin containing repeating units represented by the following formula (1) and repeating units containing silicon atoms but not fluorine atoms. (In formula (1), R1 represents methyl, etc.; L1 represents a divalent linking group, etc.; A represents an m-valent linking group; R2 to R6 represent hydrogen atoms, etc. m represents an integer of 2 or more; n represents an integer of m-1.)

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