Resin composition, cured material, laminate, method for manufacturing cured material, method for manufacturing laminate, method for manufacturing semiconductor device, and semiconductor device.
TW202635780APending Publication Date: 2026-09-01FUJIFILM CORP
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Patent Information
- Application Number
- TW115105059
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-17
- Filing Date
- 2026-02-09
- Publication Date
- 2026-09-01
Abstract
The present invention provides a resin composition, a cured product formed by curing the resin composition, a laminate containing the cured product, a method for manufacturing the cured product, a method for manufacturing the laminate, a method for manufacturing a semiconductor device including the method for manufacturing the cured product, and a semiconductor device containing the cured product. The resin composition comprises: a polyimide having a reactive functional group at its end that can be protected; and a compound B that reacts with the reactive functional group by at least one of heat, acid, and alkali.
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