Photocurable silicon oxide compositions and their cured products

TW202635784APending Publication Date: 2026-09-01SHIN ETSU CHEMICAL CO LTD
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Patent Information

Application Number
TW114144383
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-03
Filing Date
2025-11-14
Publication Date
2026-09-01
Patent Text Reader

Abstract

This invention relates to a photocurable silica composition comprising the following components (A) to (C): 100 parts by mass of (A) an organopolysiloxane having two or more acrylonitrile groups, two or more methacrylonitrile groups, or one or more acrylonitrile groups and one or more methacrylonitrile groups in one molecule; 0.1 to 10 parts by mass of (B) a photoradical polymerization initiator; and 0.1 to 10 parts by mass of (C) a compound having a Si-NR1 structure and a Si-OR2 structure in one molecule [R1 is a monovalent hydrocarbon group having 1 to 12 carbon atoms or a group represented by -R3-SiR43, and R2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 12 carbon atoms]. This provides a photoradical curable silica composition and its cured form, which exhibits good adhesion to components in contact with during curing. none
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