Etching gas containing hexafluoro-2-butyne
TW202635862APending Publication Date: 2026-09-01DAIKIN INDUSTRIES LTD
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Patent Information
- Application Number
- TW115103372
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-03-25
- Filing Date
- 2026-01-28
- Publication Date
- 2026-09-01
Abstract
The object of this invention is to novelly provide an etching gas containing hexafluoro-2-butyne. That is, an etching gas containing hexafluoro-2-butyne.
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