Reactor system

TW202635921APending Publication Date: 2026-09-01ASM IP HLDG BV
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Patent Information

Application Number
TW115118422
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-06-21
Filing Date
2022-06-14
Publication Date
2026-09-01

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Abstract

Reactor systems and methods for forming a layer comprising indium gallium zinc oxide are disclosed. The layer comprising indium gallium zinc oxide can be formed using one or more reaction chambers of a process module.
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