Flow control ring assembly, reactor, and substrate processing method
TW202635935APending Publication Date: 2026-09-01ASM IP HLDG BV
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Patent Information
- Application Number
- TW114151569
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-03
- Filing Date
- 2025-12-29
- Publication Date
- 2026-09-01
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Abstract
A flow control ring assembly for a gas-phase reactor, the reactor, a reactor system, and a method are disclosed. The flow control ring assembly can be configured to mitigate particle formation during substrate processing. The flow control ring assembly includes a spacer plate, a flow control ring, and a chamber isolation ring.
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