Valve and chamber matching

Abstract

A method for providing secondary control parameters for controlling a secondary vacuum valve (10') includes: generating primary control parameters for controlling a primary vacuum valve (10) by providing target process information; providing a first process chamber (1) including the primary vacuum valve (10) to control the flow rate of fluid entering or leaving the first process chamber (1); executing a reference process cycle based on the target process information; deriving first process information related to the first process chamber (1) by changing the valve position of the valve closing element of the primary vacuum valve (10); adjusting the valve position by comparing the first process information with the target process information; deriving primary control parameters for the primary vacuum valve (10) based on at least the derived first process information and the associated valve position; providing a second process chamber (1') including the secondary vacuum valve (10') to control the flow rate of fluid entering or leaving the second process chamber (1'); and controlling the secondary vacuum valve (10') based on the primary control parameters, wherein the primary control parameters are provided as secondary control parameters. Method for providing secondary controlling parameters for controlling a secondary vacuum valve (10’), the method comprises generating primary controlling parameters for controlling a primary vacuum valve (10) by providing a target processing information, providing a first process chamber (1) comprising the primary vacuum valve (10) to control a fluid flow into or out of the first process chamber (1), running a reference processing cycle with variation of valve positions of a valve closure of the primary vacuum valve (10) as a function of the target processing information with deriving a first processing information related to the first process chamber (1), and adjusting the valve positions based on comparing the first processing information with the target processing information, and deriving the primary controlling parameters for the primary vacuum valve (10) based at least on the derived first processing information and the related valve positions,providing a second process chamber (1’) comprising the secondary vacuum valve (10’) to control a fluid flow into or out of the second process chamber (1’), and controlling the secondary vacuum valve (10’) based on the primary controlling parameters, wherein the primary controlling parameters are provided as secondary controlling parameters.,

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