Analysis apparatus and analysis method

TW202636134APending Publication Date: 2026-09-01HAMAMATSU PHOTONICS KK
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Patent Information

Application Number
TW114140631
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-23
Filing Date
2025-10-21
Publication Date
2026-09-01

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Abstract

The analysis apparatus 1 of the present invention includes: an LSI tester 3, which inputs a test pattern signal TP to a semiconductor device D and outputs a trigger signal indicating the start timing of the test pattern signal TP and a test result signal TR indicating the test result of the semiconductor device D, i.e., success (Pass) or failure (Fail); an SSPD 13, which detects light generated from a field of view set on the semiconductor device D and outputs a detection signal; and a processing unit 19, which processes the trigger signal and the detection signal, measures the elapsed time from the start timing to the detection signal, generates emission timing data indicating the elapsed time, classifies the emission timing data into either success or failure based on the test result signal TR output from the LSI tester 3, and counts the frequency of the elapsed time indicated by a plurality of emission timing data when the test pattern signal TP is repeatedly input for each of success and failure.
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