Metrology target

TW202636210APending Publication Date: 2026-09-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW114141827
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-25
Filing Date
2025-10-29
Publication Date
2026-09-01

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Abstract

A new metrology target configured for measuring a parameter of a patterning process comprises first and second portions. The first and second portions comprise substantially the same pattern in a first direction, are each periodic in a first direction, have a first pitch (p1) in the first direction and have a unit cell in the first direction comprising a set of at least two gratings. The first and second portions are generally mutually interleaved such that at least in a central portion of the metrology target, each set of at least two gratings of one of the first and second portions is positioned between two adjacent sets of at least two gratings of the other one of the first and second portions. The first and second portions have a different pattern in a second direction that is generally perpendicular to the first direction.
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