Lithography apparatus, article manufacturing method, information processing apparatus, and program

TW202636218APending Publication Date: 2026-09-01CANON KK
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW114143679
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-14
Filing Date
2025-11-10
Publication Date
2026-09-01

Smart Images

  • Figure TWG2TA001074633_001
    Figure TWG2TA001074633_001
  • Figure TWG2TA001074633_002
    Figure TWG2TA001074633_002
  • Figure TWG2TA001074633_003
    Figure TWG2TA001074633_003
Patent Text Reader

Abstract

A lithography apparatus is configured to execute a job of performing pattern transfer on one or more substrates having a plurality of shot regions using one or more originals. The apparatus includes an original stage, and a controller that determines a transfer procedure that can complete the job at maximum speed based on a number of originals to be used in the job and a number of substrates to be processed.
Need to check novelty before this filing date? Find Prior Art