System and method for detecting a break in a pellicle

TW202636221APending Publication Date: 2026-09-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW114148579
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-19
Filing Date
2025-12-11
Publication Date
2026-09-01

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Abstract

The present invention provides a system for detecting a break in a pellicle for use with a patterning device in a lithographic apparatus, the system comprising: a support structure for holding a patterning device, the support structure being electrically coupled to the patterning device; a sensor configured to measure, via the electrical coupling, a property associated with potential induced on the patterning device due to photons reaching the patterning device during exposure, wherein the system is configured to detect the break in the pellicle based on the measured property.
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