Detection apparatus, detection method, program, lithography apparatus, and article manufacturing method

Abstract

A detection apparatus for detecting a position of a mark formed on a substrate is provided. The apparatus includes a processor configured to perform processing of detecting the position of the mark by template matching including calculation of a degree of correlation between an image of the mark and a template while changing a relative position between the image and the template. In the template matching, the processor determines a relative position to be set as a target of the calculation of the degree of correlation based on a result of comparing, with a threshold, feature amounts of a plurality of pixels of the image corresponding to a plurality of feature points included in the template at each of a plurality of relative positions between the image and the template.

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