System and method for plasma pulsing scheme selection and optimization

Abstract

A method includes determining process parameters of a plasma process based on a desired objective function and determining a pulsing scheme of the plasma process based on the desired objective function. The pulsing scheme includes a pulsing petameter matrix including timing and power-level parameters of a radio frequency (RF) source power supply and a bias power supply. The method includes sending the process parameters and the pulsing scheme to a plasma apparatus, introducing a substrate into a process chamber of the plasma apparatus, and performing the plasma process on the substrate using the process parameters and the pulsing scheme.

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