Memory device, semiconductor device and method of manufacturing semiconductor device

TW202636441APending Publication Date: 2026-09-01TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information

Application Number
TW114118940
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-18
Filing Date
2025-05-20
Publication Date
2026-09-01

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Abstract

A memory device embodiment includes a front-end-of-line (FEOL) portion that includes a word line driver configured to output a word line signal to a first word line and a second word line, and a memory cell portion over the FEOL portion. The memory cell portion includes memory cells accessible as at least two memory cell arrays, including a first memory cell array that includes a first plurality of memory cells electrically coupled to the first word line, and a second memory cell array that includes a second plurality of memory cells electrically coupled to the second word line.
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