Apparatus for positioning charged particle

TW202636479APending Publication Date: 2026-09-01ASML NETHERLANDS BV
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Patent Information

Application Number
TW114152144
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-14
Filing Date
2025-12-31
Publication Date
2026-09-01

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Abstract

An apparatus for positioning a charged particle relative to a target location of a substrate, the apparatus comprising: a positioning field generator configured to generate a positioning field such that the charged particle follows a curved trajectory within the positioning field; and a substrate support configured to rotate the substrate so as to control a velocity of the charged particle relative to the target location.
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