Magnetically enhanced resistive and dielectric barrier discharge

Abstract

The present disclosure provides a substrate processing chamber configured to produce an inductively coupled plasma. In one example, the substrate processing chamber includes a chamber body, a substrate support assembly disposed within the chamber body, a lid assembly enclosing a processing region within the chamber body, the lid assembly comprising an inductive coil configured to generate a plasma within the processing region of the chamber body, at least one magnet coupled to a magnet power source, and at least one electrode circumferentially extending along a perimeter of the chamber body. The at least one electrode is positioned below a metal lid support ring and above the at least one magnet.

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