Replaceable top and middle rings for substrate processing system

Abstract

A top edge ring for a plasma processing system includes an annular body and an annular rim extending from a bottom side of the annular body and located at a radially inner edge of the annular body. R arcuate rims extend from the bottom side of the annular body around a radially outer edge of the annular body, where R is an integer greater than two. An annular groove is arranged between the R arcuate rims and the annular rim. R radial slots are arranged between circumferentially facing edges of the R arcuate rims. G grooves extend into a bottom side of the R arcuate rim, where G is an integer greater than two.

Images