Electrostatic shields for plasma processing chambers
TW202636491APending Publication Date: 2026-09-01LAM RES CORP
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114142595
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-04
- Filing Date
- 2025-11-03
- Publication Date
- 2026-09-01
Smart Images
Figure 00000000_0000_ABST
Abstract
A system includes a substrate processing chamber, one or more coils arranged along the substrate processing chamber, the one or more coils including an outer coil segment and an inner coil segment, and an electrostatic shield arranged between the coils and the substrate processing chamber to cover only the outer coil segment of the one or more coils. Other example systems and electrostatic shields are also disclosed.
Need to check novelty before this filing date? Find Prior Art