Plasma treatment unit

Abstract

A plasma processing apparatus includes: a plasma processing chamber; a substrate support disposed within the plasma processing chamber; an upper electrode assembly disposed above the substrate support; and a magnetic field generating unit disposed above the upper electrode assembly; the magnetic field generating unit includes: a plurality of electromagnet units, each having a top surface disposed along a coplanar plane, and each electromagnet unit includes an electromagnet and a yoke that at least partially covers the electromagnet; a cooling plate in contact with the top surface of the plurality of electromagnet units; and at least one additional yoke extending downward from at least one of the plurality of electromagnet units.

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