Plasma processing apparatus, substrate processing system and fixture

Abstract

This invention provides a technique for facilitating the loading and unloading of components between plasma processing apparatuses or substrate processing systems. The invention provides a plasma processing apparatus having a processing chamber. The apparatus includes: a first component; a second component; and a fixture that secures the first and second components in an axially detachable manner, and includes a male component and a female component; the male component is fixed to the first component; the female component is fixed to the second component and receives the male component. The male component includes a shaft member extending axially and having an increased radius at its front end. The female component includes: a receiving member fixed to the second component; a holding member disposed within the receiving member; and a spherical member held by the holding member. The spherical member, when the holding member moves axially and toward the opening (i.e., a first direction), is guided inward in a radial direction by a push-out portion of the inner wall of the receiving member.

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