Vertical cavity surface laser and manufacturing method thereof

Abstract

The present application relates to a vertical cavity surface laser and a manufacturing method thereof, belonging to the field of semiconductor technology. The manufacturing method comprises: providing a substrate; forming a first electrode on the substrate in an electrode area; forming a first passivation layer on the substrate and the first electrode; forming a first conductive layer on a side of the first passivation layer away from the substrate, wherein a positive projection of the first conductive layer on the substrate partially overlaps with a positive projection of the first electrode on the substrate, and an overlapping portion extends in a direction away from the positive projection of the light-emitting area on the substrate; based on a preset mask plate, etching the first passivation layer to form a through hole, the preset mask plate having a first opening, a positive projection of the first opening on the substrate covering a positive projection of the through hole on the substrate and extending into the positive projection of the first conductive layer on the substrate; and forming a second conductive layer filling the through hole and covering the first conductive layer.

Images