Substrate manufacturing method

TW202636709APending Publication Date: 2026-09-01MITSUI METAL CO LTD
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Patent Information

Application Number
TW114139704
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-18
Filing Date
2025-10-15
Publication Date
2026-09-01

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Abstract

A method for manufacturing a substrate is provided, which enables easy separation of a carrier and a device layer. The method includes: preparing a laminate on a carrier having a release layer and a device layer sequentially disposed thereon; depositing a resin layer comprising a curable resin on the carrier-side surface of the laminate to obtain a resin-attached laminate; causing the resin layer to shrink by curing the resin-attached laminate with the curable resin, thereby stretching the carrier in the direction of resin layer shrinkage, thus changing the shape of the carrier or the resin-attached laminate; and utilizing the shape change of the carrier to generate shear stress between the carrier and the device layer, thereby peeling the device layer from the resin-attached laminate at the release layer location.
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