Integrated circuit device and forming method thereof
TW202636800APending Publication Date: 2026-09-01TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information
- Application Number
- TW114115778
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-15
- Filing Date
- 2025-04-25
- Publication Date
- 2026-09-01
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Abstract
In accordance with some disclosed embodiments, an IC device includes a first power rail, a second power rail, and a third power rail. A plurality of active regions extend over the substrate and a plurality of conductive contacts extend over the first active region and the second active region. A first via is connected to the first conductive contact and the third power rail. A second via is connected to the second conductive contact and the third power rail. A first portion of the first conductive contact on the second side of the third power rail is electrically disconnected from the first via, and a second portion of the second conductive contact on the first side of the third power rail is electrically disconnected from the second via.
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