Integrated circuit device and forming method thereof

TW202636800APending Publication Date: 2026-09-01TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
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Patent Information

Application Number
TW114115778
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-15
Filing Date
2025-04-25
Publication Date
2026-09-01

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Abstract

In accordance with some disclosed embodiments, an IC device includes a first power rail, a second power rail, and a third power rail. A plurality of active regions extend over the substrate and a plurality of conductive contacts extend over the first active region and the second active region. A first via is connected to the first conductive contact and the third power rail. A second via is connected to the second conductive contact and the third power rail. A first portion of the first conductive contact on the second side of the third power rail is electrically disconnected from the first via, and a second portion of the second conductive contact on the first side of the third power rail is electrically disconnected from the second via.
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