Semiconductor devices

TW202636801APending Publication Date: 2026-09-01SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
TW114125690
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-11-12
Filing Date
2025-07-08
Publication Date
2026-09-01

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Abstract

A semiconductor device includes a base structure extending in a first direction; gate electrodes disposed on the base structure, extending in a second direction, and spaced apart from each other in the first direction and the second direction; a plurality of channel layers disposed on the base structure, spaced apart from each other in a third direction, and surrounded by the gate electrodes; source / drain regions connected to the plurality of channel layers on opposite sides of the gate electrodes; an isolation structure separating the gate electrodes, the plurality of channel layers, and the source / drain regions in the second direction, and extending in the first direction; and a gate connection layer electrically connecting a first gate electrode and a second gate electrode spaced apart from each other in a fourth direction, the gate connection layer disposed on the isolation structure and contacting an upper surface thereof.
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