Semiconductor device
TW202636808APending Publication Date: 2026-09-01SAMSUNG ELECTRONICS CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114137794
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-02-25
- Filing Date
- 2025-10-01
- Publication Date
- 2026-09-01
Smart Images

Figure TWG2TA001074320_001 
Figure TWG2TA001074320_002 
Figure TWG2TA001074320_003
Abstract
A semiconductor device includes a plurality of upper sheet patterns spaced apart from one another in a first direction on a first separation insulating layer, a first gate electrode surrounding the plurality of upper sheet patterns and extending in a second direction, a second gate electrode spaced apart from the first gate electrode in the second direction, a lower source / drain pattern disposed on one side of the first separation insulating layer, a first upper source / drain pattern disposed on one side of the plurality of upper sheet patterns, a first through contact and penetrating at least a portion of the first upper source / drain pattern and at least a portion of the lower source / drain pattern, and a first lower gate contact disposed on a lower surface of the second gate electrode and extending in the second direction, wherein the first lower gate contact is electrically connected to the first through contact.
Need to check novelty before this filing date? Find Prior Art