Semiconductor device

TW202636808APending Publication Date: 2026-09-01SAMSUNG ELECTRONICS CO LTD
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Patent Information

Application Number
TW114137794
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-25
Filing Date
2025-10-01
Publication Date
2026-09-01

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Abstract

A semiconductor device includes a plurality of upper sheet patterns spaced apart from one another in a first direction on a first separation insulating layer, a first gate electrode surrounding the plurality of upper sheet patterns and extending in a second direction, a second gate electrode spaced apart from the first gate electrode in the second direction, a lower source / drain pattern disposed on one side of the first separation insulating layer, a first upper source / drain pattern disposed on one side of the plurality of upper sheet patterns, a first through contact and penetrating at least a portion of the first upper source / drain pattern and at least a portion of the lower source / drain pattern, and a first lower gate contact disposed on a lower surface of the second gate electrode and extending in the second direction, wherein the first lower gate contact is electrically connected to the first through contact.
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