Fluid flow control for substrate processing chambers

Abstract

An embodiment of a gas confiner for a substrate processing chamber. The gas confiner includes a body having a pair of major sides and a pair of minor sides, wherein the pair of minor sides are shorter than the pair of major sides. In addition, the body includes an outer edge extending along the pair of major sides and the pair of minor sides and an inner edge extending along the pair of major sides and the pair of minor sides. Further, the body includes an opening through the body defined by the inner edge. A thickness of the body is different along the pair of major sides than along the pair of minor sides.

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