Substrate processing system, method of measuring state of substrate in substrate processing system, and non-transitory computer-readable medium for determining state of substrate transferring in substrate processing system
TW202636930APending Publication Date: 2026-09-01ASM IP HLDG BV
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114148052
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-12
- Filing Date
- 2025-12-09
- Publication Date
- 2026-09-01
Smart Images

Figure TWG2TA001074827_001 
Figure TWG2TA001074827_002 
Figure TWG2TA001074827_003
Abstract
A system and a process for monitoring substrates is disclosed. The system and process may include a gate valve, a robot configured to transfer a substrate from a first chamber to a second chamber through the gate valve, and a sensor array aligned with the gate valve. The sensor array may be configured to capture data of the substrate along a single dimension when the substrate is moved in view of the sensor array. The system and process may assist to provide a less complex and less time consuming way to fully inspect a wafer.
Need to check novelty before this filing date? Find Prior Art