Method and system for automated feature inspection and alignment in semiconductor fabrication

TW202636931APending Publication Date: 2026-09-01ONTO INNOVATION INC
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Patent Information

Application Number
TW114150875
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-24
Filing Date
2025-12-23
Publication Date
2026-09-01

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Abstract

The present application provides a method and system for automated inspection of a microfabricated feature on a substrate. The disclosure utilizes manipulating laser polarization in combination with the excitation and emission process, in inspection applications. The application specifically discloses selecting the polarization of the laser light by adjusting a polarization manipulator or a quarter-waveplate and / or a half waveplate between the laser source and the substrate to impart polarization to the laser light. The polarization impacts using a polarization selected to improve fluorescence emission of certain features on a substrate. The selection can be made prior to run time or dynamically during the inspection tool runtime. If the polarization is not specifically selected, then the microfabricated features may not emit much fluorescence.
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