Inspection apparatus, coupling system and inspection method
TW202636932APending Publication Date: 2026-09-01TOKYO ELECTRON LTD
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Patent Information
- Application Number
- TW114142527
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-11-15
- Filing Date
- 2025-11-03
- Publication Date
- 2026-09-01
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Abstract
This invention aims to provide a technique for shortening the inspection time or improving the inspection accuracy of multilayer substrates. The inspection apparatus of this invention inspects a multilayer substrate comprising a target substrate and a bare die bonded to the target substrate. The inspection apparatus includes: a light source; an optical system that illuminates a circular illumination area on the surface of the multilayer substrate with light emitted from the light source; a photodetector that detects reflected light from the illumination area; a driving device that changes the position of the illumination area; and a control circuit that controls the position of the illumination area. The control circuit controls: setting a hexagonal grid comprising a plurality of hexagonal regions of the same size on the surface of the multilayer substrate; and setting the center of the illumination area at the center of each of the hexagonal regions.
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