Exhaust duct component and substrate processing apparatus

TW202636945APending Publication Date: 2026-09-01SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
TW115102120
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-02-19
Filing Date
2026-01-20
Publication Date
2026-09-01

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Abstract

The purpose of this disclosure is to provide a technology that enables more uniform gas flow. The exhaust channel member 5 of this disclosure is disposed around the substrate-positioned portion 2 that supports or holds the substrate W. The exhaust channel member 5 includes N flow path members 3. The flow path members 3, viewed from above, are disposed around the substrate-positioned portion 2, forming an internal flow path FP for gas inflow. Each flow path member 3 has a plurality of exhaust holes 3a for allowing gas to flow into the internal flow path FP. In each of the flow path members 3, the plurality of exhaust holes 3a are arranged circumferentially around the substrate-positioned portion 2 in view of above, and each has an exhaust port 4a connected to the internal flow path FP1 in the most downstream section. Gas flowing in from the plurality of exhaust holes 30a in the most upstream section, specifically from the exhaust hole 30a closest to the exhaust port 4a in view of above, flows circumferentially away from the exhaust port 4a in at least one of the internal flow paths FP.
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