Functionalized pads for chemical planarization

TW202637323APending Publication Date: 2026-09-16CHEMPOWER CORP
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Patent Information

Application Number
TW115102064
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2025-01-17
Filing Date
2026-01-19
Publication Date
2026-09-16

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Abstract

Examples are disclosed that relate to a pad for performing abrasive-free chemical planarization of a substrate. The pad comprises a polymer layer configured to contact the substrate during the abrasive-free chemical planarization. The polymer layer comprises a plurality of reactive units covalently bonded within polymer chains. Each reactive unit comprises a functional group comprising one or more of a complexing agent or a hydrolyzing agent for performing the abrasive-free chemical planarization. The polymer layer comprises a plurality of molded grooves each containing turbulence-creating structures configured to cause turbulence in a planarization solution within the grooves during a planarization process.
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