Synthesis method for cerium oxide nanoparticles and chemical mechanical polishing slurry

TW202637478APending Publication Date: 2026-09-16ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
TW114148915
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-26
Filing Date
2025-12-12
Publication Date
2026-09-16
Patent Text Reader

Abstract

The invention provides a synthesis method for cerium oxide nanoparticles, comprising the following main steps: Step S1: prepare a cerium salt aqueous solution, add two types of polyvalent metal salt solutions, and mix uniformly. Step S2: configure a precipitant in a closed reaction vessel, then rapidly introduce the cerium source solution into the reaction vessel with vigorous stirring. Step S3: heat to the target temperature for crystallization. Step S4: purify and disperse the product to obtain cerium oxide nanoparticles. Compared to undoped or single-element-doped cerium oxide, the cerium oxide prepared by this method, which simultaneously incorporates two metal elements, exhibits richer oxygen vacancies and demonstrates excellent CMP (Chemical Mechanical Planarization) application properties.
Need to check novelty before this filing date? Find Prior Art