Synthesis method for cerium oxide nanoparticles and chemical mechanical polishing slurry
TW202637478APending Publication Date: 2026-09-16ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD
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Patent Information
- Application Number
- TW114148915
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-26
- Filing Date
- 2025-12-12
- Publication Date
- 2026-09-16
Abstract
The invention provides a synthesis method for cerium oxide nanoparticles, comprising the following main steps: Step S1: prepare a cerium salt aqueous solution, add two types of polyvalent metal salt solutions, and mix uniformly. Step S2: configure a precipitant in a closed reaction vessel, then rapidly introduce the cerium source solution into the reaction vessel with vigorous stirring. Step S3: heat to the target temperature for crystallization. Step S4: purify and disperse the product to obtain cerium oxide nanoparticles. Compared to undoped or single-element-doped cerium oxide, the cerium oxide prepared by this method, which simultaneously incorporates two metal elements, exhibits richer oxygen vacancies and demonstrates excellent CMP (Chemical Mechanical Planarization) application properties.
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