Liquid processing device, gas processing device, substrate processing device, and liquid processing method

TW202637489APending Publication Date: 2026-09-16SCREEN HOLDINGS CO LTD
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Patent Information

Application Number
TW114148320
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-27
Filing Date
2025-12-10
Publication Date
2026-09-16

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Patent Text Reader

Abstract

This invention provides a technique to suppress the decrease in the removal rate of organic solvents by activated carbon. The liquid treatment apparatus 8 of this invention includes an acidic liquid mixing unit 82 and an organic solvent removal unit 83. The acidic liquid mixing unit 82 mixes an acidic liquid A containing acidic components into a liquid to be treated, L, which contains organic solvents and alkaline components. Furthermore, the organic solvent removal unit 83 passes the liquid to be treated, after mixing with acidic liquid A, through activated carbon 831 to remove organic solvents from the liquid to be treated L.
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