Polymerizable monomer, polymer, chemically-amplified resist composition, and patterning process

Abstract

The present invention is a polymerizable monomer having one or more of each of acid-labile groups having different structures. This can provide: a chemically-amplified resist composition that can have sensitivity and resolution that exceed those of conventional positive resist materials, can have low LWR and low size variation, and can give an excellent process window; a polymer contained in the chemically-amplified resist composition; a polymerizable monomer used for the polymer; and a patterning process using the composition.