Monomer, polymer, chemically amplified resist composition, and pattern forming process
TW202637547APending Publication Date: 2026-09-16SHIN ETSU CHEMICAL CO LTD
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Patent Information
- Application Number
- TW114150725
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-24
- Filing Date
- 2025-12-23
- Publication Date
- 2026-09-16
Abstract
A polymer obtained from a monomer having a monocyclic lactam structure has excellent solvent solubility. A chemically amplified resist composition comprising the polymer exhibits a high sensitivity and contrast and forms a pattern of satisfactory profile having improved lithography properties such as EL, LWR, CDU and DOF.
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