Resist composition, laminate, and patterning process
TW202637552APending Publication Date: 2026-09-16SHIN ETSU CHEMICAL CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- TW114148609
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-13
- Filing Date
- 2025-12-11
- Publication Date
- 2026-09-16
Abstract
a carboxy-group-containing compound; and a solvent. This can provide: a non-chemically amplified resist composition excellent in sensitivity and limiting resolution in photolithography using a high-energy beam, especially EB lithography and EUV lithography; a laminate including the resist composition; and a patterning process using the resist composition.
Need to check novelty before this filing date? Find Prior Art