Composition for photoresist and thin film manufactured using the same

TW202637565APending Publication Date: 2026-09-16DONGJIN SEMICHEM CO LTD
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Patent Information

Application Number
TW114147647
Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-12-31
Filing Date
2025-12-05
Publication Date
2026-09-16

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Abstract

The present invention provides a photoresist composition and a thin film prepared therefrom, which has excellent storage stability and coating performance, and excellent sensitivity.
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