Method for manufacturing composition for retardation film formation and monolayer retardation material
TW202637618APending Publication Date: 2026-09-16NISSAN CHEM CORP
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Patent Information
- Application Number
- TW114149840
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-12-18
- Filing Date
- 2025-12-18
- Publication Date
- 2026-09-16
Abstract
The phase difference film forming composition of the present invention contains a polymer (P) having a terminal group derived from a polymerization control agent (A), the polymerization control agent (A) having a structure selected from the group consisting of trithiocarbonate, dithiocarbamate, dithiobenzoate and dithiocarbonate, wherein the polymer (P) is a polymer having a structural unit (X) derived from a monomeric compound having a photosensitive group (p) and a polymerizable unsaturated bond group.
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