Inkjet adaptive planarization compositions

Abstract

The present application relates to inkjet adaptive planarization compositions, methods of forming a cured film, methods of manufacturing a device, and uses of a composition for inkjet adaptive planarization. The formulation may exhibit at least one of properties as an advanced material or as a high-performance material. The formulation may be used in the nanotechnology process to make semiconductor device / display device application, for example semiconductor chip, or a liquid crystal, quantum dot, OLED display fabricated on a substrate controlled by semiconductors.